Journal Article A Modified Method for Lead Staining of Thin Sections Get access Taizan SATO Taizan SATO Search for other works by this author on: Oxford Academic PubMed Google Scholar Journal of Electron Microscopy, Volume 17, Issue 2, 1968, Pages 158–159, https://doi.org/10.1093/oxfordjournals.jmicro.a049610 Published: 01 January 1968
Journal of Electron Microscopy Template
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About the Journal of Electron Microscopy format
Journal of Electron Microscopy is a peer-reviewed journal published by Oxford University Press, covering Electron and X-Ray Spectroscopy Techniques, Advanced Electron Microscopy Techniques and Applications, Advancements in Photolithography Techniques.
| Publisher | Oxford University Press |
|---|---|
| Reference style | Author–year (OUP) Author–year — (Smith, 2023) in the text Smith, A., Jones, B. and Lee, C. (2023) 'A representative article title', Journal of Electron Microscopy, 12(3), pp. 45–58.
Formats any DOI in the closest standard style — Journal of Electron Microscopy has no published style definition, so this is an approximation. No sign-up. |
| Publishes research in | Electron and X-Ray Spectroscopy Techniques Advanced Electron Microscopy Techniques and Applications Advancements in Photolithography Techniques Advanced Materials Characterization Techniques Force Microscopy Techniques and Applications |
| ISSN | 0022-0744 |
| h-index | 62 |
| i10-index | 894 |
| Total citations | 30,937 |
| Top institutions publishing here | Hitachi (Japan) |
| You get | A submission-ready PDF and the editable LaTeX source — ready to submit. |
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Most-cited papers in Journal of Electron Microscopy
We modified Sato's lead stain in order to obtain a more stable staining solution. The staining solution formed no lead carbonate film on the surface for periods up to 3 hr after exposure to the air. No precipitates were formed in the solution kept at room temperature for over 1 year. The best results were…
One of the most important applications of focused ion beam (FIB) systems is sample preparation for transmission electron microscopy (TEM). However, the use of the FIB inherently involves changing and damaging the sample, and thereby degrades the TEM resolution. This paper addresses the beam-induced damage and artifacts, particularly in applications involving silicon semiconductors. The damage…
We present a fast procedure for scanning electron microscopy (SEM) analysis in which hexamethyldisilazane (HMDS) solvent, instead of the critical point drying, is used to remove liquids from a microbiological specimen. The results indicate that the HMDS solvent is suitable for drying samples of anaerobic cells for examination by SEM and does not cause cell…
A hexapole corrector which compensates for the spherical aberration of the objective lens has been incorporated in a commercial 200 kV transmission electron microscope (TEM) equipped with a field emission gun. The successful correction of the spherical aberration is demonstrated by decreasing the instrumental resolution limit from 0.24 nm down to about 0.13 nm. Images…