NIMR) at TU-Delft with interdisciplinary research experience in new and emerging metallic materials: bulk metallic glasses, high entropy alloys, self-healing materials, biomaterials designs, and microstructure physics, Dr. Paul Nnamchi is responsible for the metallurgical and materials academic postgraduate programs including planning and implementation of the annual management plan.He is
Advanced Materials for Optics and Electronics Template
Write in a clean editor, then format for Advanced Materials for Optics and Electronics in one click — DocuGuru applies the official Wiley template with author–year references and exports a submission-ready PDF plus the editable LaTeX source. Free to start.
About the Advanced Materials for Optics and Electronics format
Advanced Materials for Optics and Electronics is a peer-reviewed journal published by Wiley, covering Chalcogenide Semiconductor Thin Films, Semiconductor materials and devices, Quantum Dots Synthesis And Properties.
| Publisher | Wiley |
|---|---|
| Reference style | Author–year (Chicago) Author–year — (Smith, 2023) in the text Smith, Ada, Ben Jones, and Cara Lee. 2023. "A Representative Article Title." Advanced Materials for Optics and Electronics 12 (3): 45–58.
Formats any DOI in Advanced Materials for Optics and Electronics style. No sign-up. |
| Publishes research in | Chalcogenide Semiconductor Thin Films Semiconductor materials and devices Quantum Dots Synthesis And Properties Conducting polymers and applications Molecular Junctions and Nanostructures |
| ISSN | 1057-9257 |
| h-index | 33 |
| i10-index | 160 |
| Total citations | 5,340 |
| Top institutions publishing here | Centre National de la Recherche Scientifique |
| You get | A submission-ready PDF and the editable LaTeX source — ready to submit. |
Papers published in Advanced Materials for Optics and Electronics per year
Citation impact of Advanced Materials for Optics and Electronics by publication year
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Most-cited papers in Advanced Materials for Optics and Electronics
A brief survey of the precursors used for the chemical vapour deposition of the dioxides of titanium, zirconium and hafnium is presented. The review covers precursors used for the closely related process known as atomic layer chemical vapour deposition (ALCVD or ALD). Precursors delivered by standard carrier gas transport and by direct liquid injection (DLI)…
Nanometre precursor powders of ZnO and various additives are synthesised by a new technology, namely chemical coprecipitation and plasma pyrolysis. Transmission electron microscopy (TEM) and the Brunauer–Emmett–Teller (BET) method are employed to illustrate the precursor powders' properties. The ZnO and additive composite powders are composed of spherical particles whose size is about 10–50 nm. Varistors…
Volatile trends are established for a series of MU(β-diketonate)n complexes, where MU = Cu (n = 2); Al, Sc, Cr, Fe, Co, Ga (n = 3); Zr (n = 4) and β-diketonate = acetylacetonate (acac), trifluoroacetylacetonate (tfac), hexafluoroacetylacetonate (hfac) and 2,2,6,6-tetramethyl-3,5-heptanedionate (tmhd). Sublimation enthalpies (ΔHsub) were calculated from thermogravimetric analysis (TGA) data, which show that…
Only one photo-induced cyclization reaction occurs when two 1,2-dithienylethene photochromes are covalently joined. Attempts made to ring-close the second photochrome by prolonged irradiation quantitatively produced a rearranged product that could not be photobleached. Copyright © 2000 John Wiley & Sons, Ltd.