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Softwaretechnik-Trends is a peer-reviewed journal published by Springer Nature, covering Superconducting and THz Device Technology, Business Process Modeling and Analysis, Advanced Software Engineering Methodologies.
| Publisher | Springer Nature |
|---|---|
| Reference style | Superscript numbered (Nature) Superscript — small raised numerals in the text 1. Smith, A., Jones, B. & Lee, C. A representative article title. Softwaretechnik-Trends 12, 45–58 (2023).
Formats any DOI in Softwaretechnik-Trends style. No sign-up. |
| Publishes research in | Superconducting and THz Device Technology Business Process Modeling and Analysis Advanced Software Engineering Methodologies Software Engineering Research Microwave Engineering and Waveguides |
| ISSN | 0720-8928 |
| h-index | 20 |
| i10-index | 67 |
| Total citations | 2,817 |
| Top institutions publishing here | California Institute of Technology |
| You get | A submission-ready PDF and the editable LaTeX source — ready to submit. |
Citations each year’s papers have accumulated so far — the most recent years are still building up.
OPC Unified Architecture (OPC UA) is the new standard of the OPC Foundation providing interoperability in process automation and beyond. By defining abstract services, OPC UA provides a service-oriented architecture (SOA) for industrial applications – from factory floor devices to enterprise applications. OPC UA integrates the different flavors of the former OPC specifications into a…
There are in use at present three different ways of deducing the receiver noise temperature TR from the measured Y-factor, each resulting in a different value of TR . The methods differ in the way the physical of the hot and cold loads, T h and Tc (usually room temperature and liquid nitrogen), are converted…
The bandwidth of NbN phonon-cooled hot electron bolometer mixers has been systematically investigated with respect to the film thickness and film quality variation. The films, 2.5 to 10 mm thick, were fabricated on sapphire substrates using DC reactive magnetron sputtering. All devices consisted of several parallel strips, each 1 1.1 wide and 211 long, placed…
